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Recent News and Articles on the Keywords: news + nanoscale + process  Related to the article below (Last Update: 8/5/2008)

Size-specific cracking shakes out at the nanoscale
innovations report, Germany -
Manley said the time scale for phonon excitations typically occurs in picoseconds, while crack growth is a slower process involving the simultaneous ...
A First In Integrated Nanowire Sensor Circuitry
Science Daily (press release) -
?In the future, we can foresee using a variety of different optical sensors to create nanoscale devices sensitive to multiple colors in high-resolution,? ...

DailyTech
Researchers Invent Reusable Nanopatterning Process
DailyTech, IL - Jul 30, 2008
To add even more value, the nanoscale patterning process is also much cheaper than standard chemical lithography. PDMS is so common, you've probably never ...
Speaking of Science: Nanodevices could have big future in power ...
Grand Junction Sentinel, CO - Aug 3, 2008
Probably the most promising of the nanoscale technologies is the process of spray-on solar power cells. Existing solar cells are able to utilize only light ...

Nanowerk LLC
Fullerene resist materials for the 32nm node and beyond
Nanowerk LLC, HI -
(Image: Dr. Robinson, Nanoscale Physics Research Laboratory) "We have previously demonstrated that fullerene based molecular resists are capable of very ...
Penn Scientists Carve Functional Nanoribbons Using Super-Heated,
Photonics Online (press release), PA - Aug 4, 2008
These structures hold enormous promise as nanoscale devices, with the advantage that graphene's two-dimensionality lends itself to existing device ...
Researchers Demonstrate A Flexible, 1-step Assembly Of Nanoscale ...
Science Daily (press release) - Jul 25, 2008
The traditional fabrication process can take as long as a month and cost $50000 per print. In this new process, a master can be made for a fraction of the ...
Flexible nanoscale patterns to pave way for smart clothing Fresh News
all 18 news articles »
U.Va. Team Developing Black Solar Cells for a Greener Future
University of Virginia, VA -
While current solar cells reflect about 30 percent of the light energy that reaches their surface, the U.Va. team will use lasers to create tiny nanoscale ...
Study puts nanotech on front burner
Fort Wayne Journal Gazette, IN - Jul 14, 2008
And the use of a nanoscale process provides an opportunity to pragmatically cool the ever smaller computer chips during their production and allowing ...

AZoNano.com
Nanoscale Lithium Iron Phosphate Holds Key to Tomorrow's Electric ...
AZoNano.com, Australia - Jul 31, 2008
By studying lithium iron phosphate, they showed that the battery's charge-discharge cycles are made possible by a "domino cascade process. ...
Source: Google News

Self-assembled nanoscale tubular ensembles -
MR Ghadiri - Advanced Materials, 1995 - doi.wiley.com
... Research News Self-Assembled Nanoscale Tubular Ensembles By M. Reza Ghadiri* Over
the past three decades, innovative materials process- ing techniques have ...

Nanocrystalline and Nanoporous Ceramics -
H Verweij - Adv. Mater, 1998 - doi.wiley.com
... that case a new, self- organizing consolidation process is probably ... Research News ...
3. Preparation of well-dispersed nanoscale particles by emulsion precipitation ...

Nanoscale process systems engineering: Toward molecular factories, synthetic cells, and adaptive … -
N Stephanopoulos, EOP Solis, G Stephanopoulos - AIChE Journal, 2005 - doi.wiley.com
Page 1. Nanoscale Process Systems Engineering: ... Figure 2. A nanoscale process with
supramolecular unit operations, scaffold and transport mecha- nisms. ...

Low-Friction Nanoscale Linear Bearing Realized from Multiwall Carbon Nanotubes -
J Cumings, A Zettl - Science, 2000 - sciencemag.org
... of multiwall carbon nanotubes, thus realizing ultralow-friction nanoscale linear
bearings and ... The extraction and reinsertion process can be repeated many times ...

Carbon nanotubes as nanoscale mass conveyors -
BC Regan, S Aloni, RO Ritchie, U Dahmen, A Zettl - Nature, 2004 - palgrave-journals.com
... the indium concentration along the nanotubes during the transport process by using,
for ... NEWS AND VIEWS. From nanoscale conveyor belts to imaging heart tissue ...

Nanoscale process engineering -
Q Wang, F Wei - China Particuology, 2003 - Elsevier
... Wang & Wei: Nanoscale Process Engineering 217 Chikazawa, M. & Takei, T ... Nanoscale
science and engineering educa- tion activities in the United ... News, 76(45), 95-99 ...

Non-lithographic process for producing nanoscale features on a substrate -
MB Miller? - US Patent 6,270,946, 2001 - freepatentsonline.com
... with 400 GVIT/IN.sup.2 Data Storage Density," Physics News Update, Feb. ... 60/125,003,
entitled, "Non-Lithographic Process for Producing Nanoscale Features on ...

… of an aluminum nitride/polyimide nanocomposite prepared by a nonaqueous suspension process -
X Chen, KE Gonsalves - Journal of Materials Research, 1997 - mrs.org
... of an aluminum nitride/polyimide nanocomposite prepared by a nonaqueous suspension
process. ... of AlN was reduced dramatically from micron to nanoscale size. ...

Low-cost and nanoscale non-volatile memory concept for future silicon chips -
MHR Lankhorst, BW Ketelaars, R Wolters - Nature Materials, 2005 - palgrave-journals.com
... Low-cost and nanoscale non-volatile memory concept for future silicon chips. ... Top
of page Methods. Process flow for making test cells. ... NEWS AND VIEWS. ...

Modeling and optimization of the hot embossing process for micro-and nanocomponent fabrication -
M Worgull, JF H?tu, KK Kabanemi, M Heckele - Microsystem Technologies, 2006 - Springer
... of microcomponents (SPIE Conference 1997; Polymer News 25:224 ... and submicron levels
to the nanoscale and as ... the enlargement of formats to process larger numbers ...

Source: Google Scholar

New paper reveals nanoscale details of photolithography process

Scientists at the National Institute of Standards and Technology (NIST) have made the first direct measurements of the infinitesimal expansion and collapse of thin polymer films used in the manufacture of advanced semiconductor devices. It’s a matter of only a couple of nanometers, but it can be enough to affect the performance of next-generation chip manufacturing. The NIST measurements, detailed in a new paper,* offer a new insight into the complex chemistry that enables the mass production of powerful new integrated circuits.

The smallest critical features in memory or processor chips include transistor “gates.” In today’s most advanced chips, gate length is about 45 nanometers, and the industry is aiming for 32-nanometer gates. To build the nearly one billion transistors in modern microprocessors, manufacturers use photolithography, the high-tech, nanoscale version of printing technology. The semiconductor wafer is coated with a thin film of photoresist, a polymer-based formulation, and exposed with a desired pattern using masks and short wavelength light (193 nm). The light changes the solubility of the exposed portions of the resist, and a developer fluid is used to wash the resist away, leaving the pattern which is used for further processing.

Exactly what happens at the interface between the exposed and unexposed photoresist has become an important issue for the design of 32-nanometer processes. Most of the exposed areas of the photoresist swell slightly and dissolve away when washed with the developer. However this swelling can induce the polymer formulation to separate (like oil and water) and alter the unexposed portions of the resist at the edges of the pattern, roughening the edge. For a 32-nanometer feature, manufacturers want to hold this roughness to at most about two or three nanometers.

Industry models of the process have assumed a fairly simple relationship in which edge roughness in the exposed “latent” image in the photoresist transfers directly to the developed pattern, but the NIST measurements reveal a much more complicated process. By substituting deuterium-based heavy water in the chemistry, the NIST team was able to use neutrons to observe the entire process at a nanometer scale. They found that at the edges of exposed areas the photoresist components interact to allow the developer to penetrate several nanometers into the unexposed resist. This interface region swells up and remains swollen during the rinsing process, collapsing when the surface is dried. The magnitude of the swelling is significantly larger than the molecules in the resist, and the end effect can limit the ability of the photoresist to achieve the needed edge resolution. On the plus side, say the researchers, their measurements give new insight into how the resist chemistry could be modified to control the swelling to optimal levels.

###

The research, funded by SEMATECH, is part of a NIST-industry effort to better understand the complex chemistry of photoresists in order to meet the needs of next-generation photolithography.

* V.M. Prabhu, B.D. Vogt, S. Kang , A. Rao , E.K. Lin and S.K. Satija. Direct measurement of the spatial extent of the in situ developed latent image by neutron reflectivity. Journal of Vacuum Science and Technology B, 25(6), 2514-2520 (2007).

 
 
 
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